Super-Resolution Defect Characterization Using Microwave Near-Field Resonance Reflectometry and Cross-correlation Image Processing
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- 作者：Oleksandr Malyuskin ; Vincent Fusco
- 关键词：Near ; field reflectometry ; Microwave high ; resolution imaging ; Aperture ; Electromagnetic field enhancement ; Measurement ; Image ; Correlation
- 刊名：Sensing and Imaging
- 出版年：2017
- 出版时间：December 2017
- 年：2017
- 卷：18
- 期：1
- 全文大小：
- 刊物类别：Engineering
- 刊物主题：Electrical Engineering; Microwaves, RF and Optical Engineering; Imaging / Radiology;
- 出版者：Springer US
- ISSN：1557-2072
- 卷排序：18
文摘
A super-resolution defect characterization technique based on near-field resonance reflectometry and cross-correlation image processing is proposed in this paper. The hardware part of the microwave imaging system employs a novel loaded aperture (LA) probe which allows collimation of the electromagnetic field to approximately λ/10 focal spot(s) at λ/100 to λ/10 stand-off distances, λ being the wavelength of radiation in free space. The characteristic raw image spatial resolution of the LA probe is around λ/10 in one dimension with amplitude contrast/sensitivity exceeding 10–20 dB. It is demonstrated that the LA spatial resolution can be at least two times enhanced in two dimensions in the image plane using basic cross-correlation image processing while retaining a very high level of amplitude contrast of at least 10 dB.