Characterization of Negative Tone Photoresist Based on Acid Catalyzed Dehydration Crosslinking of Novolac Resins Having Pendant Carboxyl Groups

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• 作者：Hui-Hsiang Liu ; Wei-Tin Chen and Fu-Chang Wu
• 关键词：borneol ; dehydration ; development ; novolac resin ; photoacid generator ; photoresist ; resolution
• 刊名：Journal of Polymer Research
• 出版年：2002
• 出版时间：2002
• 年：2002
• 卷：9
• 期：4
• 页码：251-256
• 全文大小：176 KB
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Polymer Sciences
  Industrial Chemistry and Chemical Engineering
  Characterization and Evaluation Materials
  
• 出版者：Springer Netherlands
• ISSN：1572-8935

文摘

Esterification of 4-hydroxyphenylacetic acid with various alcohols of (+)-borneol, (±)-borneol and ethylene glycol monobutyl ether were carried out. The ester compounds were then copolymerized with various comonomers of bisphenol-A, phenol and formaldehyde. Physical properties and molecular structures of such synthesized phenolic resins were investigated by using IR, NMR, DSC, and TGA. To introduce carboxyl groups onto the side chain of the polymers, they were further functionalized with succinic anhydride. Copolymers containing pendant carboxyl groups synthesized in this investigation could be used as a negative tone photoresist. The photoresist was comprised of alkali soluble polymer with pendant carboxyl groups and photoacid generator. From the exposure characteristic curves, the exposure energy of the photoresist appeared in a range of about 2001000 mJ/cm2. It was found that adding a small amount of oxalic acid and ethylene glycol as crosslinking agents will increase the efficiency of crosslinking. In this case, the exposure energy was decreased to below 100 mJ/cm2. We investigated the thermogravimetric properties of binder resin, exposure characteristics, sensitivity and the resolution of photoresists. We also investigated the effects of exposure conditions and the concentration of crosslinking agents on the exposure characteristics of photoresists.