文摘
Conductive thin film electrodes were deposited by chemical solution deposition (CSD) from nitrate solutions onto polycrystalline and ( PTCR ceramic substrates. The electrical properties of the thin film on and of the interface consisting of and the semiconductive oxide ceramic were investigated. The deposited films were about 250 nm thick and consisted of nanosized particles. The resistivity of the film was about at 20°C. The PTCR ceramic consisted of μm sized particles and exhibited an electronic resistivity of about 10 Ωcm at 20°C and a steep increase of the resistivity of a few orders of magnitude above the Curie point at about 120°C. The electrical properties of the interface were dominated by the properties of a barrier layer between the PTCR ceramic and the electrode. The potential dependence of the impedance indicated that the barrier layer consisted of a depletion layer within the PTCR ceramic, when the flat band potential of on the PTCR ceramic at about −250 mV was exceeded. Additionally the formation of an insulating layer at the electrode has to be taken into account.