\hbox{(Ba,Ca)TiO}_{3} PTCR Ceramics with \hbox{LaNiO}_{3} Thin-Film Electrodes: Preparation and Characterization of the Interface
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文摘
Conductive \hbox{LaNiO}_{3} thin film electrodes were deposited by chemical solution deposition (CSD) from nitrate solutions onto polycrystalline \hbox{Al}_{2}\hbox{O}_{3} and (\hbox{Ba,Ca}\hbox{)TiO}_{3} PTCR ceramic substrates. The electrical properties of the \hbox{LaNiO}_{3} thin film on \hbox{Al}_{2}\hbox{O}_{3} and of the interface consisting of \hbox{LaNiO}_{3} and the semiconductive oxide ceramic were investigated. The deposited \hbox{LaNiO}_{3} films were about 250 nm thick and consisted of nanosized particles. The resistivity of the \hbox{LaNiO}_{3} film was about 3 \times 10^{-3}\ \Omega \hbox{cm} at 20°C. The PTCR ceramic consisted of μm sized particles and exhibited an electronic resistivity of about 10 Ωcm at 20°C and a steep increase of the resistivity of a few orders of magnitude above the Curie point at about 120°C. The electrical properties of the \hbox{LaNiO}_{3}/\hbox{PTCR} interface were dominated by the properties of a barrier layer between the PTCR ceramic and the \hbox{LaNiO}_{3} electrode. The potential dependence of the impedance indicated that the barrier layer consisted of a depletion layer within the PTCR ceramic, when the flat band potential of \hbox{LaNiO}_{3} on the PTCR ceramic at about −250 mV was exceeded. Additionally the formation of an insulating layer at the \hbox{LaNiO}_{3} electrode has to be taken into account.

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