On the optical properties of Ag+15 ion-beam-irradiated TiO2 and SnO2 thin films

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• 作者：Hardeep Thakur (1)
  K. K. Sharma (1)
  Ravi Kumar (1)
  Pardeep Thakur (2) (5)
  Yogesh Kumar (3)
  Abhinav Pratap Singh (3)
  Sanjeev Gautam (4)
  Keun Hwa Chae (4)
  
• 关键词：SHI irradiation ; Optical properties ; UV ; vis ; Surface modifications
• 刊名：Journal of the Korean Physical Society
• 出版年：2012
• 出版时间：November 2012
• 年：2012
• 卷：61
• 期：10
• 页码：1609-1614
• 全文大小：313KB
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• 作者单位：Hardeep Thakur (1)
  K. K. Sharma (1)
  Ravi Kumar (1)
  Pardeep Thakur (2) (5)
  Yogesh Kumar (3)
  Abhinav Pratap Singh (3)
  Sanjeev Gautam (4)
  Keun Hwa Chae (4)
  
  1. Center for Material Science and Engineering, National Institute of Technology, Hamirpur, 177-005, India
  2. European Synchrotron Radiation Facility, BP 220, F-38043, Grenoble Cedex, France
  5. Diamond Light Source Ltd., Didcot, Oxfordshire, OX11 0DE, UK
  3. Material Science Division, Inter University Accelerator Center, New Delhi, 110-067, India
  4. Advanced Analysis Center, Korea Institute of Science and Technology (KIST), Seoul, 136-791, Korea
  
• ISSN：1976-8524

文摘

The effects of 200-MeV Ag+15 ion irradiation on the optical properties of TiO2 and SnO2 thin films prepared by using the RF magnetron sputtering technique were investigated. These films were characterized by using UV-vis spectroscopy, and with increasing irradiation fluence, the transmittance for the TiO2 films was observed to increase systematically while that for SnO2 was observed to decrease. Absorption spectra of the irradiated samples showed minor changes in the indirect bandgap from 3.44 to 3.59 eV with increasing irradiation fluence for TiO2 while significant changes in the direct bandgap from 3.92 to 3.6 eV were observed for SnO2. The observed modifications in the optical properties of both the TiO2 and the SnO2 systems with irradiation can be attributed to controlled structural disorder/defects in the system.