Sputtering condition effect on structure and properties of LiNbO3 films
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- 作者：M. Sumets ; A. Kostyuchenko ; V. Ievlev…
- 刊名：Journal of Materials Science: Materials in Electronics
- 出版年：2015
- 出版时间：June 2015
- 年：2015
- 卷：26
- 期：6
- 页码：4250-4256
- 全文大小：1,761 KB
- 参考文献：1.N.H. Hur, Y.K. Park, D.H. Won, K. No, J. Mater. Res. 9, 980 (1994)View Article
2.H.E. Junhui, Y.E. Zhizhen, Chin. Sci. Bull. 48, 2290 (2003)View Article
3.A.Z. Sim?es, M.A. Zaghete, B.D. Stojanovic, A.H. Gonzalez, C.S. Riccardi, M. Cantoni, J.A. Varela, J. Eur. Ceram. Soc. 24, 1607 (2004)View Article
4.S. Shandilya, M. Tomar, V. Gupta, J. Appl. Phys. 111, 102803 (2012)View Article
5.V. Edon, D. Rèmiens, S. Saada, Appl. Surf. Sci. 256, 1455 (2009)View Article
6.V. Iyevlev, A. Kostyuchenko, M. Sumets, V. Vakhtel, J. Mater. Sci. Mater. Electron. 22, 1258 (2011)View Article
7.T.W. Noh, S.-H. Lee, D.-W. Kim, S.-M. Oh, M.J. Lim, S.-D. Lee, S.H. Han, J.W. Wu, J. Korean Phys. Soc. 32, S1307 (1998)
8.H. Akazawa, M. Shimada, J. Appl. Phys. 99, 124103 (2006)View Article
9.M. Sumets, V. Ievlev, A. Kostyuchenko, V. Vakhtel, S. Kannykin, A. Kobzev, Thin Solid Films 552, 32 (2014)View Article
10.S. Shandilya, M. Tomar, K. Sreenivas, V. Gupta, J. Phys. D Appl. Phys. 42, 095303 (2009)View Article
11.X. Wang, J. He, J. Huang, B. Zhao, Z. Ye, J. Mater. Sci. Lett. 22, 225 (2003)View Article
12.F.J. Gordillo-Vázqueza, C.N. Afonso, J. Appl. Phys. 92, 7651 (2002)View Article
13.J. Gonzalo, C.N. Afonso, J.M. Ballesteros, A. Grosman, C. Ortega, J. Appl. Phys. 82, 3129 (1997)View Article
14.V. Ievlev, M. Sumets, A. Kostyuchenko, N. Bezryadin, J. Mater. Sci. Mater. Electron. 24, 1651 (2013)View Article
15.V.M. Ievlev, M.P. Sumets, A.V. Kostyuchenko, Mater. Sci. Forum 700, 53 (2012)View Article
16.V. Ievlev, M. Sumets, A. Kostyuchenko, J. Mater. Sci. 48, 1562 (2013)View Article
17.Y. Kong, J. Xu, X. Chen, C. Zhang, W. Zhang, G. Zhang, J. Appl. Phys. 87, 4410 (2000)View Article
18.J. Blumel, E. Born, T. Metzger, J. Phys. Chem. Solids 55, 589 (1994)View Article
19.V. Iyevlev, A. Kostyuchenko, M. Sumets, Proc. SPIE 7747, 77471J-1 (2011) - 作者单位：M. Sumets (1) (2)
A. Kostyuchenko (1)
V. Ievlev (1)
S. Kannykin (1)
V. Dybov (1)
1. Voronezh State University, Universitetskaya Square, 1, 394000, Voronezh, Russia
2. Center of Gravitational Wave Astronomy, University of Texas at Brownsville, 80 Fort Brown, Brownsville, TX, 78520, USA - 刊物类别：Chemistry and Materials Science
- 刊物主题：Chemistry
Optical and Electronic Materials
Characterization and Evaluation Materials - 出版者：Springer New York
- ISSN：1573-482X
文摘
Polycrystalline LiNbO3 films were grown on various substrates by the radio-frequency magnetron sputtering (RFMS) method and ion-beam sputtering (IBS) method at different sputtering conditions. Films formed on the substrates situated within erosion zone (plasma effect) manifested textured structure. When plasma effect became insignificant only LiNbO3 films with random size orientation were formed during the RFMS process and IBS process with an increase in the size of the crystallites. Reactive gas pressure as part of plasma effect has a profound effect on the films-properties. When gas pressure was increased greatly, grain size declined two fold and the average surface roughness of the grown films doubled. At the higher gas pressure Li-poor phase LiNb3O8 appeared along with LiNbO3 during the growth process. As a result, the film texture disappeared. Single phase LiNbO3 films with two-axes (epitaxial) texture are formed on (111)Ag epitaxial film during the RFMS process at the ion assisted conditions.