Synthesis of GaN network by nitridation of hexagonal ε-Ga₂O₃ film

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• 作者：Xiaochuan Xia ; Hongwei Liang ; Xinlei Geng&#8230
• 刊名：Journal of Materials Science: Materials in Electronics
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：28
• 期：3
• 页码：2598-2601
• 全文大小：
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Optical and Electronic Materials; Characterization and Evaluation of Materials;
• 出版者：Springer US
• ISSN：1573-482X
• 卷排序：28

文摘

GaN network structure was synthesized on a hexagonal ε-Ga₂O₃ film by performing thermal nitridation under ammonia atmosphere in III-nitride MOCVD system. High-resolution X-ray diffraction revealed that the GaN had a (0002) preferred orientation, and no other polymorphs of GaN were detected. X-ray photoelectron spectroscopy results confirmed the formation of Ga–N bonds as well as other element status induced from nitridation process. According to field-emission scanning electron microscopy and atomic force microscopy images, the surface of GaN layer shows network morphology, which was caused by etching from hydrogen gas along GaN grain boundary. Our results indicated the potential applications of nitrided GaN/ε-Ga₂O₃ structure in fabricating novel electronic and optoelectronic devices.