Phase-field modeling of epitaxial growth with the Ehrlich-Schwoebel barrier: Model validation and application

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• 作者：XiangLei Dong (1)
  Hui Xing (1)
  Sha Sha (1)
  ChangLe Chen (1)
  LiWei Niu (1)
  JianYuan Wang (1)
  KeXin Jin (1)
  
  1. Shaanxi Key Laboratory for Condensed Matter Structure and Properties ; Department of Applied Physics ; Northwestern Polytechnical University ; Xi鈥檃n ; 710129 ; China
  
• 关键词：epitaxial growth ; phase ; field method ; Ehrlich ; Schwoebel barrier ; kinetics ; interfacial
• 刊名：SCIENCE CHINA Technological Sciences
• 出版年：2015
• 出版时间：April 2015
• 年：2015
• 卷：58
• 期：4
• 页码：753-762
• 全文大小：1,961 KB
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• 刊物类别：Engineering
• 刊物主题：Chinese Library of Science
  Engineering, general
  
• 出版者：Science China Press, co-published with Springer
• ISSN：1869-1900

文摘

In this paper, we introduce different forms of mobility into a quantitative phase-field model to produce arbitrary Ehrlich-Schwoebel (ES) effects. Convergence studies were carried out in the one-side step-flow model, which showed that the original mobility not only induces the ES effect, but also leads to larger numerical instability with increase of the step width. Thus, another modified form of the ES barrier is proposed, and is found to be more suitable for large-scale simulations. Model applications were performed on the wedding-cake structure, coarsening and coalescence of islands and spiral growth. The results show that the ES barrier exhibits more significant kinetic effects at the larger deposition rates by limiting motions of atoms on upper steps, leading to aggregation on the top layers, as well as the roughening of growing surfaces.