Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration

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• 作者：Jiří Bulíř ; Tomáš Zikmund ; Michal Novotný ; Ján Lančok ; Ladislav Fekete…
• 刊名：Applied Physics A: Materials Science & Processing
• 出版年：2016
• 出版时间：April 2016
• 年：2016
• 卷：122
• 期：4
• 全文大小：1,829 KB
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• 作者单位：Jiří Bulíř (1)
  Tomáš Zikmund (1)
  Michal Novotný (1)
  Ján Lančok (1)
  Ladislav Fekete (1)
  Libor Juha (1)
  
  1. Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21, Prague 8, Czech Republic
  
• 刊物类别：Physics and Astronomy
• 刊物主题：Physics
  Condensed Matter
  Optical and Electronic Materials
  Nanotechnology
  Characterization and Evaluation Materials
  Surfaces and Interfaces and Thin Films
  Operating Procedures and Materials Treatment
  
• 出版者：Springer Berlin / Heidelberg
• ISSN：1432-0630

文摘

We report on excitation of the photoluminescence of lithium fluoride by means of the surface plasmon resonance of Al layer. Advantage of this method is high efficiency of the excitation, which is applicable to ultra-thin films. P-polarized UV diode laser light is coupled to the surface plasmon resonance using a fused silica prism in Kretschmann configuration. The angular dependence of the reflected intensity is measured using a theta–2theta goniometer. The surface plasmon at resonance condition induces photoluminescence in the adjacent lithium fluoride layer. The fluoride layers were deposited on Al-coated fused silica substrates by electron beam evaporation. For the experiment, we prepared several samples with thickness ranging from 20 to 71 nm. We studied the effect of the luminescence enhancement by the surface plasmon resonance effect. Strong quenching effect was observed in the thinnest LiF layer. Influence of X-ray irradiation on the photoluminescence was studied.