Electron Flood Gun Damage Effects in 3D Secondary Ion Mass Spectrometry Imaging of Organics

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• 作者：Rasmus Havelund (1)
  Martin P. Seah (1)
  Alexander G. Shard (1)
  Ian S. Gilmore (1)
  
• 关键词：Secondary ion mass spectrometry ; 3D imaging ; Depth profiling ; Damage ; Electron flood gun
• 刊名：Journal of The American Society for Mass Spectrometry
• 出版年：2014
• 出版时间：September 2014
• 年：2014
• 卷：25
• 期：9
• 页码：1565-1571
• 全文大小：1,086 KB
• 参考文献：1. Mahoney, C.M.: Cluster secondary ion mass spectrometry of polymers and related materials. Mass Spectrom. Rev. 29, 247-93 (2010)
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  5. Shard, A.G., Havelund, R., Seah, M.P., Spencer, S.J., Gilmore, I.S., Winograd, N., Mao, D., Miyayama, T., Niehuis, E., Rading, D., Moellers, R.: Argon cluster ion beams for organic depth profiling: results from a VAMAS interlaboratory study. Anal. Chem. 84, 7865-873 (2012) CrossRef
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  8. Lee, J.L.S., Ninomiya, S., Matsuo, J., Gilmore, I.S., Seah, M.P., Shard, A.G.: Organic depth profiling of a nanostructured delta layer reference material using large argon cluster ions. Anal. Chem. 82, 98-05 (2010) CrossRef
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• 作者单位：Rasmus Havelund (1)
  Martin P. Seah (1)
  Alexander G. Shard (1)
  Ian S. Gilmore (1)
  
  1. National Physical Laboratory, Teddington, TW11 0LW, UK
  
• ISSN：1879-1123

文摘

Electron flood guns used for charge compensation in secondary ion mass spectrometry (SIMS) cause chemical degradation. In this study, the effect of electron flood gun damage on argon cluster depth profiling is evaluated for poly(vinylcarbazole), 1,4-bis((1-naphthylphenyl)amino)biphenyl and Irganox 3114. Thin films of these three materials are irradiated with a range of doses from a focused beam of 20?eV electrons used for charge neutralization. SIMS chemical images of the irradiated surfaces show an ellipsoidal damaged area, approximately 3?mm in length, created by the electron beam. In depth profiles obtained with 5?keV Ar2000 + sputtering from the vicinity of the damaged area, the characteristic ion signal intensity rises from a low level to a steady state. For the damaged thin films, the ion dose required to sputter through the thin film to the substrate is higher than for undamaged areas. It is shown that a damaged layer is formed and this has a sputtering yield that is reduced by up to an order of magnitude and that the thickness of the damaged layer, which increases with the electron dose, can be as much as 20?nm for Irganox 3114. The study emphasizes the importance of minimizing the neutralizing electron dose prior to the analysis. Figure ?/em>