From self-assembled monolayers to chemically patterned brushes: Controlling the orientation of block copolymer domains in films by substrate modification

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• 作者：Xiao-sa Jin ; Yuan-yuan Pang ; Sheng-xiang Ji 季生象
• 刊名：Chinese Journal of Polymer Science
• 出版年：2016
• 出版时间：June 2016
• 年：2016
• 卷：34
• 期：6
• 页码：659-678
• 全文大小：3,480 KB
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Condensed Matter Physics
  Industrial Chemistry and Chemical Engineering
  Polymer Sciences
  Characterization and Evaluation of Materials
  
• 出版者：Chinese Chemical Society and Institute of Chemistry, CAS, co-published with Springer
• ISSN：1439-6203
• 卷排序：34

文摘

Block copolymer lithography is emerging as one of the leading technologies for patterning nanoscale dense features. In almost all potential applications of this technology, control over the orientation of cylindrical and lamellar domains is required for pattern transfer from the block copolymer film. This review highlights the state-of-art development of brushes to modify the substrates to control the assembly behaviors of block copolymers in films. Selected important contributions to the development of self-assembled monolayers, polymer brushes and mats, and chemically patterned brushes are discussed.KeywordsSelf-assemblyBlock copolymerNeutral brushChemical patternWetting behavior