Self-etching aspects of a three-step etch-and-rinse adhesive
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- 作者：Jose Bahillo (1)
Miguel Roig (2)
Tissiana Bortolotto (3)
Ivo Krejci (4) - 关键词：Etch and rinse ; OptiBond FL ; Marginal adaptation ; Class V ; Etch pattern
- 刊名：Clinical Oral Investigations
- 出版年：2013
- 出版时间：November 2013
- 年：2013
- 卷：17
- 期：8
- 页码：1893-1900
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- 作者单位：Jose Bahillo (1)
Miguel Roig (2)
Tissiana Bortolotto (3)
Ivo Krejci (4)
1. Department of Operative Dentistry and Endodontics, International University of Catalonia, Sant Cugat del Valles, 08195, Barcelona, Spain
2. Department of Operative Dentistry and Endodontics, School of Dentistry, International University of Catalonia, Sant Cugat del Valles, 08195, Barcelona, Spain
3. Division of Cariology and Endodontology, School of Dentistry, University of Geneva, Rue Barthelemy-Menn, 19, 1205, Geneva, Switzerland
4. Division of Cariology and Endodontology, School of Dentistry, University of Geneva, Rue Barthelemy-Menn, 19, CH-1205, Geneva, Switzerland - ISSN：1436-3771
文摘
Purpose The purpose of this study is to assess the marginal adaptation of cavities restored with a three-step etch-and-rinse adhesive, OptiBond FL (OFL) under different application protocols. Materials and methods Twenty-four class V cavities were prepared with half of the margins located in enamel and half in dentin. Cavities were restored with OFL and a microhybrid resin composite (Clearfil AP-X). Three groups (n=8) that differed in the etching technique were tested with thermomechanical loading, and specimens were subjected to quantitative marginal analysis before and after loading. Micromorphology of etching patters on enamel and dentin were observed with SEM. Data was evaluated with Kruskalallis and Bonferroni post hoc test. Results Significantly lower percent CM (46.919.5) were found after loading on enamel in group 3 compared to group 1 (96.55.1) and group 2 (93.18.1). However, no significant differences (p=0.30) were observed on dentin margins. Conclusions Etching enamel with phosphoric acid but avoiding etching dentin before the application of OFL, optimal marginal adaptation could be obtained, evidencing a self-etching primer effect. Clinical relevance A reliable adhesive interface was attained with the application of the three-step etch-and-rinse OFL adhesive with a selective enamel etching, representing an advantage on restoring deep cavities.