Epitaxial growth of ZnO films on (100) and (001) γ-LiAlO2 substrates by pulsed laser deposition
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- 作者：Jun Zou ; Shengming Zhou ; Jun Xu ; Xia Zhang ; Xiaomin Li ; Zili Xie ; Ping Han and Rong Zhang
- 刊名：Journal of Materials Science
- 出版年：2006
- 出版时间：September, 2006
- 年：2006
- 卷：41
- 期：18
- 页码：5937-5940
- 全文大小：614 KB
- 刊物类别：Chemistry and Materials Science
- 刊物主题：Chemistry
Materials Science
Characterization and Evaluation Materials
Polymer Sciences
Continuum Mechanics and Mechanics of Materials
Crystallography
Mechanics - 出版者：Springer Netherlands
- ISSN：1573-4803
文摘
Structural and optical properties were investigated for ZnO films grown on (100) and (001) γ-LiAlO2 (LAO) substrates by pulsed laser deposition method. According XRD results, it is intuitionistic that (100) LAO is suitable for fabricating high quality ZnO film, while (001) LAO is unsuitable. The FWHM of XRD, stress in film and FWHM of UV PL spectra for ZnO films on (100) LAO show a decreasing with increasing substrate temperature from 300 to 600 °C. ZnO film fabricated at 600 °C has the greatest grain size, the smallest stress (0.47 Gpa) and PL FWHM value (～85 meV). This means that the substrate temperature of 600 °C is optimum for ZnO film deposited on (100) LAO. Moreover, it was found that the UV PL spectra intensity of ZnO film is not only related to the grain size and stoichiometric, but also depends on the stress in the film.