Surface Morphological and Nanomechanical Properties of PLD-Derived ZnO Thin Films

详细信息    查看全文

• 作者：Sheng-Rui Jian (1)
  I-Ju Teng (2)
  Ping-Feng Yang (3)
  Yi-Shao Lai (3)
  Jian-Ming Lu (4)
  Jee-Gong Chang (4)
  Shin-Pon Ju (5)
  
• 关键词：ZnO ; PLD ; AFM ; Nanoindentation ; Nanoscratch ; Hardness
• 刊名：Nanoscale Research Letters
• 出版年：2008
• 出版时间：May 2008
• 年：2008
• 卷：3
• 期：5
• 页码：186-193
• 全文大小：457KB
• 参考文献：1. D.C. Look, J.W. Hemsky, J.R. Sizelove, Phys. Rev. Lett. 82, 2552 (1999) CrossRef
  2. A. Tsukazaki, M. Kubota, A. Ohtomo, T. Onuma, K. Ohtani, H. Ohno, S.F. Chichibu, M. Kawasaki, Jpn. J. Appl. Phys. 44, L643 (2005) CrossRef
  3. G. Beshkov, G.P. Vassilev, M.R. Elizalde, T.G. Acebo, Mater. Chem. Phys. 82, 452 (2003) CrossRef
  4. X.D. Li, H. Gao, C.J. Murphy, K.K. Caswell, Nano Lett. 3, 1495 (2003) CrossRef
  5. X. Tao, X. Wang, X.D. Li, Nano Lett. 7, 3172 (2007) CrossRef
  6. C.H. Chien, S.R. Jian, C.T. Wang, J.Y. Juang, J.C. Huang, Y.S. Lai, J. Phys. D: Appl. Phys. 40, 3985 (2007) CrossRef
  7. S. Ruffell, J.E. Bradby, J.S. Williams, Appl. Phys. Lett. 89, 091919 (2006) CrossRef
  8. E. Le Bourhis, G. Patriarche, Micro. 38, 377 (2007) CrossRef
  9. S.R. Jian, Nanoscale Res. Lett. 3, 6 (2008) CrossRef
  10. B. Bhushank, X.D. Li, Inter. Mater. Rev. 48, 125 (2003) CrossRef
  11. B. Bhushan (ed.), / Springer Handbook of Nanotechnology (Springer, Heidelberg, Germany, 2004)
  12. G. Wei, B. Bhushan, N. Ferrell, D. Hansford, J. Vac. Sci. Technol. A 23, 1856 (2005) CrossRef
  13. A. Tsukazaki, A. Ohtomo, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S.F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. Koinuma, M. Kawasaki, Nature Mater. 4, 42 (2005) CrossRef
  14. K. Ip, Y.W. Heo, D.P. Norton, S.J. Peatron, J.R. LaRoche, F. Ren, Appl. Phys. Lett. 85, 1169 (2004) CrossRef
  15. K. Miyoshi, Y.W. Chung, / Surface Diagnostics in Tribology: Fundamental Principles and Applications (World Scientific Publishing, Singapore, 1993)
  16. D. Cáceres, I. Vergara, R. González, E. Monroy, F. Calle, E. Mu?oz, F. Omnès, J. Appl. Phys. 86, 6773 (1999) CrossRef
  17. X.D. Li, B. Bhushan, Mater. Charact. 48, 11 (2002) CrossRef
  18. W.C. Oliver, G.M. Pharr, J. Mater. Res. 7, 1564 (1992) CrossRef
  19. P.F. Yang, H.C. Wen, S.R. Jian, Y.S. Lai, S. Wu, R.S. Chen, Microelectron. Reliab. 48, 389 (2008) CrossRef
  20. C. Charitidis, Y. Panayiotatos, S. Logothetidis, Diamond Relat. Mater. 12, 1088 (2003) CrossRef
  21. S.O. Kucheyev, J.E. Bradby, J.S. Williams, C. Jagadish, M.V. Swain, Appl. Phys. Lett. 80, 956 (2002) CrossRef
  22. J.E. Bradby, S.O. Kucheyev, J.S. Williams, C. Jagadish, M.V. Swain, P. Munroe, M.R. Phillips, Appl. Phys. Lett. 80, 4537 (2002) CrossRef
  23. S.J. Bull, J. Phys. D: Appl. Phys. 38, R393 (2005) CrossRef
  24. I. Zarudi, J. Zou, L.C. Zhang, Appl. Phys. Lett. 82, 874 (2003) CrossRef
  25. G. Patriarche, F. Glas, G.L. Roux, L. Largeau, A. Mereuta, J.L. Benchimol, J. Cryst. Growth 221, 12 (2000) CrossRef
  26. S. Brochard, J. Rabier, J. Grillhe, Eur. Phys. J. AP. 2, 99 (1998) CrossRef
  27. V.A. Coleman, J.E. Bradby, C. Jagadish, P. Munroe, Y.W. Heo, S.J. Pearton, D.P. Norton, M. Inoue, M. Yano, Appl. Phys. Lett. 86, 203105 (2005) CrossRef
  28. S. Zhao, Y. Zhou, Y. Liu, K. Zhao, S. Wang, W. Xiang, Z. Liu, P. Han, Z. Zhang, Z. Chen, H. Lu, K. Jin, B. Cheng, G. Yang, Appl. Surf. Sci. 253, 726 (2006) CrossRef
  29. R. Navamethavan, K.K. Kim, D.K. Hwang, S.J. Park, J.H. Hahn, T.G. Lee, G.S. Kim, Appl. Surf. Sci. 253, 464 (2006) CrossRef
  30. X.D. Li, H.S. Gao, C.J. Murphy, L.F. Gou, Nano Letters 10, 1903 (2004) CrossRef
  31. T.W. Scharf, J.A. Barnard, Thin Solid Fillms 308-09, 340 (1997) CrossRef
  32. A. Leyland, A. Mattews, Wear 246, 1 (2000) CrossRef
  33. W. Ni, Y.T. Cheng, M. Lukitsch, A.M. Weiner, L.C. Lev, D.S. Grummon, Wear 259, 842 (2005) CrossRef
  
• 作者单位：Sheng-Rui Jian (1)
  I-Ju Teng (2)
  Ping-Feng Yang (3)
  Yi-Shao Lai (3)
  Jian-Ming Lu (4)
  Jee-Gong Chang (4)
  Shin-Pon Ju (5)
  
  1. Department of Materials Science and Engineering, I-Shou University, Kaohsiung, 840, Taiwan, ROC
  2. Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu, 300, Taiwan, ROC
  3. Central Labs, Advanced Semiconductor Engineering, Kaohsiung, 811, Taiwan, ROC
  4. National Center for High-Performance Computing, National Applied Research Laboratories, No. 28, Nanke 3rd Rd., Sinshih Township, Tainan County, 74147, Taiwan, ROC
  5. Department of Mechanical and Electro-Mechanical Engineering; Center for Nanoscience and Nanotechnology, National Sun-Yat-Sen University, Kaohsiung, 804, Taiwan, ROC
  
• ISSN：1556-276X

文摘

This study reports the surface roughness and nanomechanical characteristics of ZnO thin films deposited on the various substrates, obtained by means of atomic force microscopy (AFM), nanoindentation and nanoscratch techniques. ZnO thin films are deposited on (a- and c-axis) sapphires and (0001) 6H-SiC substrates by using the pulsed-laser depositions (PLD) system. Continuous stiffness measurements (CSM) technique is used in the nanoindentation tests to determine the hardness and Young’s modulus of ZnO thin films. The importance of the ratio (H/E film) of elastic to plastic deformation during nanoindentation of ZnO thin films on their behaviors in contact-induced damage during fabrication of ZnO-based devices is considered. In addition, the friction coefficient of ZnO thin films is also presented here.