Deposition of multicomponent filmlike coating on metal substrate using plasma focus device
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- 作者：E. V. Morozov ; S. A. Maslyaev ; A. S. Demin…
- 关键词：plasma focus ; multicomponent filmlike coating ; Auger spectroscopy ; nanohardness ; modification of the surface nanolayer
- 刊名：Inorganic Materials: Applied Research
- 出版年：2016
- 出版时间：September 2016
- 年：2016
- 卷：7
- 期：5
- 页码：796-803
- 全文大小：1,096 KB
- 刊物类别：Chemistry and Materials Science
- 刊物主题：Chemistry
Inorganic Chemistry
Russian Library of Science
Industrial Chemistry and Chemical Engineering - 出版者：MAIK Nauka/Interperiodica distributed exclusively by Springer Science+Business Media LLC.
- ISSN：2075-115X
- 卷排序：7
文摘
Results of the investigation of multicomponent coating deposition on the metal substrate in the cathode part of a dense plasma focus device are presented. The features of the processes accompanying the coating are considered: evaporation of elements of chromium-manganese austenite 25Cr12Mn20W tube, which was located along the axis of the plasma focus PF-1000 chamber, under high temperature dense deuterium plasma and deposition of the elements on the model material in form of a copper arc. It is shown that, in the realized exposure mode (the power density of the plasma flow qp = 108–109 W/cm2 in the zone of its impact on the tube and qp = 106 W/cm2 in the region of interaction of the plasma with the copper substrate), the proposed method makes it possible to obtain a coating of submicron thickness on the substrate surface, which includes the evaporated elements of the steel tube. The combined action of powerful streams of fast deuterons and hot plasma in the central part of the copper arc was examined. The structural state, elemental composition, mechanical characteristics, and possible mechanisms for hardening of the deposited film coating are discussed.