Influence of deposition parameters on the structure and optical property of Zn(S,O) films
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- 作者：Du-Cheng Tsai ; Bing-Hau Kuo ; Zue-Chin Chang…
- 关键词：optical materials ; sputtering ; crystal structure ; optical properties ; X ; ray diffraction
- 刊名：Metals and Materials International
- 出版年：2017
- 出版时间：January 2017
- 年：2017
- 卷：23
- 期：1
- 页码：163-169
- 全文大小：
- 刊物类别：Chemistry and Materials Science
- 刊物主题：Metallic Materials; Operating Procedures, Materials Treatment; Magnetism, Magnetic Materials; Engineering Thermodynamics, Heat and Mass Transfer; Characterization and Evaluation of Materials; Continuu
- 出版者：The Korean Institute of Metals and Materials
- ISSN：2005-4149
- 卷排序：23
文摘
This paper presents the influence of process parameters, including sputtering power, oxygen partial pressure (RO), and substrate temperature on the optical property of Zn(S,O) thin films fabricated by radio frequency magnetron sputtering technology and deposited on glass substrates. The chemical composition, structural and optical properties of the samples were investigated by electron spectroscopy for chemical analysis, X-ray diffraction, and spectrophotometer. All the films mainly exhibited β-ZnS phase with (111) preferred orientation. [S]/([S]+[O]) ratio increased at high sputtering power, low RO, and low substrate temperature. Moderate ranges in sputtering power and substrate temperature and low RO resulted in large grain size. Adatoms are expected to exhibit increased mobility under these conditions. Average transmittance exceeded 75% in the visible wavelength region. Bandgap under these conditions was dominated strongly by the change in grain size and [S]/([S]+[O]) ratio. Optical properties of Zn(S,O) thin films could be modified, which is promising for optoelectronic applications.