Nanoscale Cu₂O films: Radio-frequency magnetron sputtering and structural and optical studies

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• 作者：D. A. Kudryashov ; A. S. Gudovskikh ; A. V. Babichev ; A. V. Filimonov…
• 刊名：Semiconductors
• 出版年：2017
• 出版时间：January 2017
• 年：2017
• 卷：51
• 期：1
• 页码：110-114
• 全文大小：
• 刊物类别：Physics and Astronomy
• 刊物主题：Magnetism, Magnetic Materials; Physics, general;
• 出版者：Pleiades Publishing
• ISSN：1090-6479
• 卷排序：51

文摘

Nanoscale copper (I) oxide layers are formed by magnetron-assisted sputtering onto glassy and silicon substrates in an oxygen-free environment at room temperature, and the structural and optical properties of the layers are studied. It is shown that copper oxide formed on a silicon substrate exhibits a lower degree of disorder than that formed on a glassy substrate, which is supported by the observation of a higher intensity and a smaller half-width of reflections in the diffraction pattern. The highest intensity of reflections in the diffraction pattern is observed for Cu₂O films grown on silicon at a magnetron power of 150 W. The absorption and transmittance spectra of these Cu₂O films are in agreement with the well-known spectra of bulk crystals. In the Raman spectra of the films, phonons inherent in the crystal lattice of cubic Cu₂O crystals are identified.