Structure, composition, and mechanical properties of thin films of transition metals diborides

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• 作者：A. A. Goncharov ; S. N. Dub ; A. V. Agulov ; V. V. Petukhov
• 关键词：thin films ; nanoindentation ; hardness ; HfB2 ; TaB2
• 刊名：Journal of Superhard Materials
• 出版年：2015
• 出版时间：November 2015
• 年：2015
• 卷：37
• 期：6
• 页码：422-428
• 全文大小：414 KB
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• 作者单位：A. A. Goncharov (1) (3)
  S. N. Dub (2)
  A. V. Agulov (1) (4)
  V. V. Petukhov (1) (4)
  
  1. Donbass State Engineering Academy, ul. Skadinova 72, Kramatorsk, Donetsk region, 83013, Ukraine
  3. Sumy State University, ul. Rimskogo-Korsakova 2, Sumy, 40007, Ukraine
  2. Bakul Institute for Superhard Materials, National Academy of Sciences of Ukraine, vul. Avtozavods’ka 2, Kiev, 04074, Ukraine
  4. Scientific Physicotechnological Center of National Academy of Sciences and Ministry of Education and Science of Ukraine, pl. Svobody 6, Kharkov, 61022, Ukraine
  
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Physical Chemistry
  Russian Library of Science
  
• 出版者：Allerton Press, Inc. distributed exclusively by Springer Science+Business Media LLC
• ISSN：1934-9408

文摘

The effect of the deposition conditions on the structure, composition, and mechanical properties of thin films of diborides of transition metals that have been produced by high frequency magnetron sputtering. It has been shown that depending on the applied bias voltage and substrate temperature coatings of various structures are formed: from amorphous-like to nanocrystalline. Under the optimal energy conditions (bias voltage 50 V and substrate temperature 500°C) superstoichiometric thin films of transition metals diborides of grain sizes 20–30 nm, hardness 44 GPa, and anomalously high recovering of the imprint depth have been produced. Keywords thin films nanoindentation hardness HfB₂ TaB₂