Simulation analysis of combined UV/blue photodetector in CMOS process by technology computer-aided design
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  • 作者:Changping Chen (1)
    Xiangliang Jin (1)
    Lizhen Tang (1)
    Hongjiao Yang (1)
    Jun Luo (2)
  • 关键词:ultraviolet (UV)/blue photodetector ; weak light detection ; complimentary metal ; oxide ; semiconductor (CMOS) ; technology computer ; aided design (TCAD)
  • 刊名:Frontiers of Optoelectronics
  • 出版年:2014
  • 出版时间:March 2014
  • 年:2014
  • 卷:7
  • 期:1
  • 页码:69-73
  • 全文大小:344 KB
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  • 作者单位:Changping Chen (1)
    Xiangliang Jin (1)
    Lizhen Tang (1)
    Hongjiao Yang (1)
    Jun Luo (2)

    1. Faculty of Materials, Optoelectronics and Physics, Xiangtan University, Xiangtan, 411105, China
    2. Department of Precision Mechanical Engineering, Shanghai University, Shanghai, 200444, China
  • ISSN:2095-2767
文摘
A composite ultraviolet (UV)/blue photodetector structure has been proposed, which is composed of P-type silicon substrate, Pwell, Nwell and N-channel metaloxide-semiconductor field-effect transistor (NMOSFET) realized in the Pwell. In this photodetector, lateral ringshaped Pwell-Nwell junction was used to separate the photogenerated carriers, and non-equilibrium excess hole was injected to the Pwell bulk for changing the bulk potential and shifting the NMOSFET’s threshold voltage as well as the output drain current. By technology computer-aided design (TCAD) device, simulation and analysis of this proposed photodetector were carried out. Simulation results show that the combined photodetector has enhanced responsivity to UV/blue spectrum. Moreover, it exhibits very high sensitivity to weak and especially ultral-weak optical light. A sensitivity of 7000 A/W was obtained when an incident optical power of 0.01 μW was illuminated to the photodetector, which is 35000 times higher than the responsivity of a conventional silicon-based UV photodiode (usually is about 0.2 A/W). As a result, this proposed combined photodetector has great potential values for UV applications.

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