Delta-doped tunnel FET (D-TFET) to improve current ratio ( \(I_\mathrm{ON}/I_\mathrm{OFF}\) ) and ON-current performance

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• 作者：S. Panda ; S. Dash ; S. K. Behera ; G. P. Mishra
• 刊名：Journal of Computational Electronics
• 出版年：2016
• 出版时间：September 2016
• 年：2016
• 卷：15
• 期：3
• 页码：857-864
• 全文大小：2,190 KB
• 刊物类别：Engineering
• 刊物主题：Electronic and Computer Engineering
  Optical and Electronic Materials
  Mathematical and Computational Physics
  Applied Mathematics and Computational Methods of Engineering
  Mechanical Engineering
  
• 出版者：Springer Netherlands
• ISSN：1572-8137
• 卷排序：15

文摘

A two dimensional (2D) analytical drain current model has been developed for a delta-doped tunnel field-effect transistor (D-TFET) that can address the ON-current issues of the conventional TFET. Insertion of a highly doped delta layer in the source region paves the way for improved tunneling volume and thus provides high drain current as compared with TFETs. The present model takes into account the effects of the distance between the delta-doping region and the source–channel interface on the subthreshold swing (SS), current ratio, and ON-current performance. The D-TFET is predicted to have a higher current ratio \(\left( {\frac{I_\mathrm{ON} }{I_\mathrm{OFF} }\cong 10^{11}} \right) \) compared with TFETs \(\left( {\frac{I_\mathrm{ON} }{I_\mathrm{OFF} }\cong 10^{10}} \right) \) with a reasonable SS \(\left( {{\sim }52\,\mathrm{mV/dec}} \right) \) and \(V_\mathrm{th}\) performance at an optimal position of 2 nm from the channel. The surface potential, electric field, and minimum tunneling distance have been derived using the solution of the 2D Poisson equation. The accuracy of the D-TFET model is validated using the technology computer aided design (TCAD) device simulator from Synopsys.KeywordsD-TFETDelta-doping regionON-currentSubthreshold swing