Development of electrospray laser chemical vapour deposition for homogenous alumina coatings
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  • 作者:Teiichi Kimura
  • 关键词:electrospray laser chemical vapour deposition ; homogenous Alumina ; coating
  • 刊名:Journal of Wuhan University of Technology--Materials Science Edition
  • 出版年:2016
  • 出版时间:February 2016
  • 年:2016
  • 卷:31
  • 期:1
  • 页码:11-14
  • 全文大小:914 KB
  • 参考文献:[1]Chigier N. Challenges for Future Research in Atomization and Spray Technology, Atomization and Sprays[J]. Atomization and Sprays, 2006 (16): 727–736CrossRef
    [2]Klampfl C W, Himmelsbach M. Direct Ionization Methods in Mass Spectrometry: An Overview[J]. Anal. Chimica Acta, 2015 (890):44–49CrossRef
    [3]Jaworek A. Electrospray Droplet Sources for Thin Film Deposition[J]. J. Mater. Sci., 2007 (42): 266–297CrossRef
    [4]Taflin D C, Ward T L, Davis E J. Electrified Droplet Fission and The Rayleigh Limit[J]. Langmuir, 1989 (5): 376–384CrossRef
    [5]Gu W, Heil1 PE, Choi H, et al. Generation of Stable Multi-Jets by Flow-Limited Field-Injection Electrostatic Spraying and Their Control via IV Characteristics[J]. J. Phys. D: Appl. Phys., 2010 (43): 492001CrossRef
    [6]Ito A, Kadokura H, Kimura T, et al. Texture and Orientation Characteristics of A-Al2O3 Films Prepared by Laser Chemical Vapour Deposition using Nd:YAG Laser[J]. J. Alloys Compd., 2010 (489): 469–474
    [7]Kadokura H, Ito A, Kimura T, et al. Moderate Temperature and High-Speed Synthesis of A-Al2O3 Films by Laser Chemical Vapour Deposition Using Nd:YAG Laser[J]. Surf. Coat. Technol., 2010 (204): 2 302–2 306
    [8]Miyazaki H, Kimura T, Goto T. Acceleration of Deposition Rates in a Chemical Vapor Deposition Process by Laser Irradiation[J]. Jpn. J. Appl. Phys., 2003(42): L316–318
  • 作者单位:Teiichi Kimura (1) (2)

    1. Japan Fine Ceramics Center, 2-4-1, Mutsuno, Atsuta-ku, Nagoya, 456-8587, Japan
    2. State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan, 430070, China
  • 刊物类别:Chemistry and Materials Science
  • 刊物主题:Chemistry
    Materials Science
    Chinese Library of Science
  • 出版者:Wuhan University, co-published with Springer
  • ISSN:1993-0437
文摘
Electrospray, as a liquid source supply system, has been applied to chemical vapour deposition (CVD). In thermal CVD, the microstructure of the obtained films changes from dense to coarse granular because of the decreasing surface temperature during deposition. Using the electrospray laser chemical vapour deposition method, we prepared homogenous alumina coatings. We found that laser irradiation was effective in compensating the surface temperature decrease, and an alpha-alumina coating with dense columnar microstructures was obtained at a deposition rate of 200 μm/h using 200 W Nd:YAG laser irradiation. Key words electrospray laser chemical vapour deposition homogenous Alumina coating

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