AlGaAs film growth using thermionic vacuum arc (TVA) and determination of its physical properties

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• 作者：Soner ?zen ; Volkan ?enay ; Suat Pat ; ?adan Korkmaz
• 刊名：The European Physical Journal Plus
• 出版年：2015
• 出版时间：June 2015
• 年：2015
• 卷：130
• 期：6
• 全文大小：1,085 KB
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• 作者单位：Soner ?zen (1)
  Volkan ?enay (1) (2)
  Suat Pat (1)
  ?adan Korkmaz (1)
  
  1. Physics Department, Eskisehir Osmangazi University, 26480, Eskisehir, Turkey
  2. Primary Science Education Department, Bayburt University, 69000, Bayburt, Turkey
  
• 刊物类别：Physics and Astronomy
• 刊物主题：Condensed Matter Physics
  Statistical Physics, Dynamical Systems and Complexity
  Atomic, Molecular, Optical and Plasma Physics
  Applied and Technical Physics
  Theoretical, Mathematical and Computational Physics
  
• 出版者：Springer Berlin / Heidelberg
• ISSN：2190-5444

文摘

In this research, an AlGaAs film was deposited on a microscope slide by means of the thermionic vacuum arc (TVA) technique which is a novel plasma production technique. AlGaAs structures were grown by this deposition technique for the first time and this process occurred in a very short period of time. In order to characterize the produced film, nano-structural, nano-mechanical, optical, and surface properties were determined by field emission scanning electron microscope (FESEM), atomic force microscope (AFM), X-ray diffractometer (XRD) and interferometer. According to the results of the measurements, the mean thickness value of the produced film was obtained as 1.8 μm. The band gap value was determined as 2eV from the Kubelka-Munk plot. The refractive index value was obtained as approximately 3.4. Hardness value was determined as 2 GPa from the Oliver-Pharr method. All these values are consistent with the reported values in the literature for the AlGaAs films produced by different methods. TVA technique appeared as a suitable and promising technique for the production of AlGaAs films.