Simulation of the removal of a lead film from graphene by the irradiation of a target with a beam of xenon clusters

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• 作者：A. E. Galashev ; V. A. Polukhin
• 关键词：graphene ; xenon cluster ; stress ; film ; lead
• 刊名：Russian Journal of Physical Chemistry B, Focus on Physics
• 出版年：2016
• 出版时间：January 2016
• 年：2016
• 卷：10
• 期：1
• 页码：15-22
• 全文大小：782 KB
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• 作者单位：A. E. Galashev (1)
  V. A. Polukhin (2)
  
  1. Institute of High Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences, Yekaterinburg, 620219, Russia
  2. Institute of Materials Science and Metallurgy, Yeltsin Ural Federal University, Yekaterinburg, 620002, Russia
  
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Physical Chemistry
  Russian Library of Science
  
• 出版者：MAIK Nauka/Interperiodica distributed exclusively by Springer Science+Business Media LLC.
• ISSN：1990-7923

文摘

The removal of a lead film from graphene by irradiating a target with a beam of xenon clusters at an incidence angle of 60° was studied by the molecular dynamics method. The complete purification of graphene was achieved at beam energies of 10 and 15 eV. Visual observation and the calculated density profiles and mobility components of the lead atoms indicate the predominantly collective nature of the separation of Pb from graphene in the course of bombardment. When a beam of clusters with an energy of 15 eV acts on the target, the detached film of lead takes a torch shape and has strong internal stresses. The graphene sheet acquires maximum roughness at a beam energy of 10 eV as a result of a large number of the direct hits of xenon clusters on its surface.