Reducing Friction Force of Si Material by Means of Atomic Layer-Deposited ZnO Films
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- 作者：Zhimin Chai ; Yuhong Liu ; Xinchun Lu ; Dannong He
- 关键词：Friction force ; ALD ; ZnO film ; Adhesion force ; Mechanical property
- 刊名：Tribology Letters
- 出版年：2014
- 出版时间：October 2014
- 年：2014
- 卷：56
- 期：1
- 页码：67-75
- 全文大小：2,238 KB
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Yuhong Liu (1)
Xinchun Lu (1)
Dannong He (2)
1. The State Key Laboratory of Tribology, Tsinghua University, Beijing, 100084, China
2. National Engineering Research Center for Nanotechnology, Shanghai, 200241, China - ISSN：1573-2711
文摘
With excellent lubricating property, zinc oxide (ZnO) films are promising candidates to act as protective coatings in Si-based microelectromechanical system devices for the purpose of decreasing friction forces of silicon (Si) material. In this paper, the nanotribological behavior of ZnO films prepared by atomic layer deposition on a Si (100) substrate is investigated by an atomic force microscope. The ZnO films have various thicknesses ranging from 10.0 to 182.1?nm. With the increase of film thickness, the root-mean-square roughness of the films increases, while the ratio of hardness to Young’s modulus (H/E) decreases. Due to their large surface roughness, the thick ZnO films are low in adhesion force. The friction force of the ZnO films is smaller than that of the Si (100) substrate and is greatly influenced by their adhesion force and mechanical property. In a low-load condition, the friction force is dominated by the adhesion force, and thus, the friction force of the ZnO films decreases as film thickness increases. While in a high-load condition, the friction force is dominated by plowing. Films with higher H/E possess smaller friction force, and thus, the friction force increases with the decreasing film thickness.