Determination of the number densities of CH(X2Π) and CH(A2Δ) radicals in a DC cascaded arc discharge plasma
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- 作者：Xingwei Wu ; Cong Li ; Yong Wang ; Zhiwei Wang ; Chunlei Feng…
- 刊名：Applied Physics B: Lasers and Optics
- 出版年：2015
- 出版时间：September 2015
- 年：2015
- 卷：120
- 期：4
- 页码：659-666
- 全文大小：866 KB
- 参考文献：1.H. Tahara, Y. Ando, T. Yoshikawa, IEEE Trans. Plasma Sci. 31, 281 (2003)View Article ADS
2.J. Benedikt, K.G.Y. Letourneur, M. Wisse, D.C. Schram, M.C.M. de Sanden, Diam. Relat. Mater. 11, 989 (2002)View Article ADS
3.C.J. Rennick, J. Ma, J.J. Henney, J.B. Wills, M.N.R. Ashfold, A.J. Orr-Ewing, Y.A. Mankelevich, J. Appl. Phys. 102, 063309 (2007)View Article ADS
4.N.P. Rao, N. Tymiak, J. Blum, A. Neuman, H.J. Lee, S.L. Girshick, P.H. McMurry, J. Heberlein, J. Aerosol Sci. 29, 707 (1998)View Article
5.B. de Groot, Z. Ahmad, R.P. Dahiya, R. Engeln, W.J. Goedjeer, N.J.L. Cardozo, V. Veremiyenko, Fusion Eng. Des. 66-8, 413 (2003)View Article
6.J. Luque, W. Juchmann, J.B. Jeffries, Appl. Opt. 36, 3261 (1997)View Article ADS
7.Y.A. Mankelevich, M.N.R. Ashfold, A.J. Orr-Ewing, J. Appl. Phys. 102, 063310 (2007)View Article ADS
8.J.C. Richley, O.J.L. Fox, M.N.R. Ashfold, Y.A. Mankelevich, J. Appl. Phys. 109, 063307 (2011)View Article ADS
9.S. Brezinsek, A. Pospieszczyk, A. Kirschner, G. Sergienko, A. Huber, V. Philipps, P. Mertens, U. Samm, M.F. Stamp, A. Meigs, P.T. Greenland, J.-E. Contributors, Phys. Scr. T111, 42 (2004)View Article ADS
10.J.B. Wills, J.A. Smith, W.E. Boxford, J.M.F. Elks, M.N.R. Ashfold, A.J. Orr-Ewing, J. Appl. Phys. 92, 4213 (2002)View Article ADS
11.A. Okeefe, D.A.G. Deacon, Rev. Sci. Instrum. 59, 2544 (1988)View Article ADS
12.A.N. Goyette, J.E. Lawler, L.W. Anderson, D.M. Gruen, T.G. McCauley, D. Zhou, A.R. Krauss, Plasma Sources Sci. Technol. 7, 149 (1998)View Article ADS
13.P. John, J.R. Rabeau, J.I.B. Wilson, Diam. Relat. Mater. 11, 608 (2002)View Article ADS
14.J. Ma, M.N. Ashfold, Y.A. Mankelevich, J. Appl. Phys. 105, 043302 (2009)View Article ADS
15.X. Wu, C. Li, C. Zhang, H. Ding, Plasma Sci. Technol. 16, 142 (2014)View Article ADS
16.C. Wang, J. Anal. Atom. Spectrom. 22, 1347 (2007)View Article
17.W. Demtr?der, Laser Spectroscopy Vol. 1: Basic Principles (Springer, Berlin Heidelberg, 2008)
18.J. Luque, P. Berg, J. Jeffries, G. Smith, D. Crosley, J. Scherer, Appl. Phys. B 78, 93 (2004)View Article ADS
19.G.D. Stancu, M. Janda, F. Kaddouri, D.A. Lacoste, C.O. Laux, J. Phys. Chem. A 114, 201 (2010)View Article
20.U. Fantz, S. Meir, J. Nucl. Mater. 337, 1087 (2005)View Article ADS
21.N. Balcon, A. Aanesland, R. Boswell, Plasma Sources Sci. Technol. 16, 217 (2007)View Article ADS
22.I.H. Hutchinson, Principles of Plasma Diagnostics (Cambridge University Press, Cambridge, 2005)
23.G.M.W. Kroesen, D.C. Schram, J.C.M. Dehaas, Plasma Chem. Plasma P 10, 531 (1990)View Article
24.C.H. Chang, J.D. Ramshaw, Phys. Plasmas 1, 3698 (1994)View Article ADS
25.H. Park, W. Choe, Curr. Appl. Phys. 10, 1456 (2010)View Article ADS
26.J. Luque, D.R. Crosley, SRI Int. Rep. MP 99, 009 (1999)
27.J. Koulidiati, A. Czernichowski, J.J. Beulens, D.C. Schram, Acta Phys. Pol. A 94, 3 (1998)
28.R. Engeln, K.G.Y. Letourneur, M.G.H. Boogaarts, M.C.M. van de Sanden, D.C. Schram, Chem. Phys. Lett. 310, 405 (1999)View Article ADS
29.R. Celiberto, R. Janev, D. Reiter, Plasma Phys. Control. Fusion 51, 085012 (2009)View Article ADS
30.D.C. Schram, R.A.B. Zijlmans, O. Gabriel, R. Engeln, J. Phys. Conf. Ser. 192, 012012 (2009)View Article ADS
31.R. Janev, D. Reiter, Phys. Plasmas 9, 4071 (2002)View Article ADS
32.R. Janev, D. Reiter, Phys. Plasmas 11,?780 (2004)View Article ADS
33.M. Koltunov, M.Z. Tokar, Plasma Phys. Control. Fusion 53, 065015 (2011)View Article ADS
34.R.W.P. McWhirter, Plasma Diagnostic Techniques (Academic Press, New York, 1965)
35.A. Yanguas-Gil, J. Cotrino, A.R. Gonzalez-Elipe, J. Appl. Phys. 99, 033104 (2006)View Article ADS
36.C. Li, J. Zhang, Z. Yao, X. Wu, C. Zhang, H. Ding, Plasma Sci. Technol. 15, 875 (2013)View Article ADS
37.R. Ramos, G. Cunge, M. Touzeau, N. Sadeghi, J. Phys. D Appl. Phys. 41, 115205 (2008)View Article ADS
38.M.C.M. van de Sanden, M. van Hest, A. de Graaf, A.H.M. Smets, K.G.Y. Letourneur, M.G.H. Boogaarts, D.C. Schram, Diam. Relat. Mater. 8, 677 (1999)View Article ADS
39.S. Selezneva, M. Rajabian, D. Gravelle, M. Boulos, J. Phys. D Appl. Phys. 34, 2862 (2001)View Article ADS
40.D. Reiter, B. Küppers, HYDKIN, online reaction kinetics analysis for hydrocarbon catabolism in hydrogen plasmas, http://?www.?hydkin.?de/-/span> - 作者单位：Xingwei Wu (1)
Cong Li (1)
Yong Wang (1)
Zhiwei Wang (1)
Chunlei Feng (1)
Hongbin Ding (1)
1. School of Physics and Optical Engineering, Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Chinese Ministry of Education, Dalian University of Technology, Dalian, 116024, People’s Republic of China - 刊物类别：Physics and Astronomy
- 刊物主题：Physics
Electromagnetism, Optics and Lasers
Physical Chemistry
Laser Technology and Physics and Photonics
Quantum Optics, Quantum Electronics and Nonlinear Optics
Optical Spectroscopy and Ultrafast Optics
Physics and Applied Physics in Engineering - 出版者：Springer Berlin / Heidelberg
- ISSN：1432-0649
文摘
A combination of optical emission spectroscopy (OES) and cavity ring-down spectroscopy (CRDS) has enabled to determinate the number densities of CH(A2Δ) and CH(X2Π) radicals simultaneously in a cascaded arc plasma reactor operating with a CH4/Ar mixture. It is found that the number density of CH(A2Δ) radical increases with discharge current at first and then decreases. However, the number density of CH(X2Π) radical decreases with discharge current when the rate of CH4 flow to total flow is lower than 1?%, while it increases slightly with discharge current when the rate is 1.5?%. The results reveal that CH radicals are deviation from excitation equilibrium. Although OES is the simplest and most straightforward means to investigate the CH radical behavior, it is not enough to provide the information of the CH(X2Π) number density, and additional methods, such as CRDS, are needed in the cascaded arc plasma jet.