Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement

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• 作者：Weimin Zhou ; Guoquan Min ; Jing Zhang ; Yanbo Liu ; Jinhe Wang…
• 关键词：Nanoimprint lithography ; Soft molecular scale ; Nanofabrication
• 刊名：Nano-Micro Letters
• 出版年：2011
• 出版时间：June 2011
• 年：2011
• 卷：3
• 期：2
• 页码：135-140
• 全文大小：271KB
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• 作者单位：Weimin Zhou (110)
  Guoquan Min (110)
  Jing Zhang (110)
  Yanbo Liu (110)
  Jinhe Wang (110)
  Yanping Zhang (110)
  Feng Sun (110)
  
  110. Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai, 200237, China
  
• 刊物类别：Nanotechnology and Microengineering; Nanotechnology; Nanoscale Science and Technology;
• 刊物主题：Nanotechnology and Microengineering; Nanotechnology; Nanoscale Science and Technology;
• 出版者：Springer Berlin Heidelberg
• ISSN：2150-5551

文摘

Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier. Keywords Nanoimprint lithography Soft molecular scale Nanofabrication