Microstructure, morphology and sunlight response of cuprous oxide thin films

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• 作者：Min Zhao ; Yaoyao Jiang ; Jianguo Lv ; Yue Sun…
• 刊名：Journal of Materials Science: Materials in Electronics
• 出版年：2016
• 出版时间：February 2016
• 年：2016
• 卷：27
• 期：2
• 页码：1799-1804
• 全文大小：1,332 KB
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• 作者单位：Min Zhao (1)
  Yaoyao Jiang (1)
  Jianguo Lv (1)
  Yue Sun (1)
  Li Cao (1)
  Gang He (2)
  Miao Zhang (2)
  Zhaoqi Sun (2)
  
  1. School of Electronic and Information Engineering, Hefei Normal University, Hefei, 230601, China
  2. School of Physics and Material Science, Anhui University, Hefei, 230039, China
  
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Optical and Electronic Materials
  Characterization and Evaluation Materials
  
• 出版者：Springer New York
• ISSN：1573-482X

文摘

Cuprous oxide thin films were successfully synthesized on FTO substrates via the electrochemical method by changing the deposition potential. The effects of deposition potential on the microstructure, morphology, optical band gap and photoresponse of the thin films were investigated. The results revealed that intensity of (111) diffraction peak and preferential orientation along (111) plane increase with increasing the absolute value of deposition potential. The thin film with the more negative deposition potential has an increased average particle size and compact degree. The optical band gap of the sample deposited at −0.5 eV presents the largest value of 1.82 eV. Upon sunlight illumination, the photocurrent of thin film rises quickly at first and then gets slower. The slow photoresponse may be attributed to the capture of carriers by deep level traps in our case.