刊名:Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
出版年:2016
出版时间:March 2016
年:2016
卷:10
期:2
页码:445-449
全文大小:334 KB
刊物类别:Chemistry and Materials Science
刊物主题:Chemistry Surfaces and Interfaces and Thin Films Russian Library of Science
出版者:MAIK Nauka/Interperiodica distributed exclusively by Springer Science+Business Media LLC.
ISSN:1819-7094
卷排序:10
文摘
The results of estimating different projection approximation schemes (a modified least-squares method and the Galerkin and Ritz methods) are presented. They are used to simulate the distribution of minority charge carriers, which is observed as a result of the diffusion of minority charge carriers generated by a broad electron beam in a homogeneous semiconductor material. Certain computational features of the implementation of the considered methods are considered.Keywordssemiconductorbroad electron beamminority-charge-carrier distributionprojection approximation