Enhanced transmittance modulation of ITO/NiO x /ZrO2:H/WO3/ITO electrochromic devices
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  • 作者:Yuliang Zhou ; Xungang Diao ; Guobo Dong ; Zhonghou Wu ; Dongmei Dong ; Mei Wang
  • 关键词:ZrO2 ; H film ; Operation potential ; Thickness ; Electrochromic device
  • 刊名:Ionics
  • 出版年:2016
  • 出版时间:January 2016
  • 年:2016
  • 卷:22
  • 期:1
  • 页码:25-32
  • 全文大小:2,166 KB
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  • 作者单位:Yuliang Zhou (1)
    Xungang Diao (1)
    Guobo Dong (1)
    Zhonghou Wu (1)
    Dongmei Dong (1)
    Mei Wang (1)

    1. School of Physics and Nuclear Energy Engineering, Beihang University, Beijing, 100191, People’s Republic of China
  • 刊物类别:Chemistry and Materials Science
  • 刊物主题:Chemistry
    Electrochemistry
    Materials Science
    Physical Chemistry
    Condensed Matter
    Renewable Energy Sources
    Electrical Power Generation and Transmission
  • 出版者:Springer Berlin / Heidelberg
  • ISSN:1862-0760
文摘
ZrO2:H thin films were deposited by DC magnetron sputtering at room temperature. The effects of thickness on structure and morphologies of ZrO2:H thin films were lucubrated. The X-ray photoelectron spectroscopy analysis reveals that the fully oxidized value of Zr (Zr4+) exists in both ZrO2 and ZrO2:H films. X-ray diffraction data show the crystallinity of ZrO2:H thin films tends to be weak and the microstructure changes slightly. Atomic force microscopy analysis presents that both the grain size and surface roughness increase as the thickness increases. Correspondingly, all-thin-film ITO/NiO x /ZrO2:H/WO3/ITO electrochromic devices (ECDs) were monolithically fabricated, among which the thickness of ZrO2:H film was adjusted. The ECD assembled with 50 nm ZrO2:H film has the best electrochromic property with transmittance modulation (ΔT) of 65.2 % at 550 nm. The effects of operation potential on ECDs were also elaborated studied. ECDs can get colored in saturated states at relatively high potential as no more unoccupied sites exist in WO3 to accommodate the continuously injected H+ ions.

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