Pore-Scale Simulations to Determine the Applied
详细信息   在线全文   PDF全文下载
  • journal_title:Vadose Zone Journal
  • Contributor:Scott A. Bradford ; Saeed Torkzaban ; Andreas Wiegmann
  • Publisher:Soil Science Society of America
  • Date:2011-
  • Format:text/html
  • Language:en
  • Identifier:10.2136/vzj2010.0064
  • journal_abbrev:Vadose Zone Journal
  • issn:1539-1663
  • volume:10
  • issue:1
  • firstpage:252
  • section:ORIGINAL RESEARCH
摘要

Values of the applied hydrodynamic torque (Tapplied) and the resisting adhesive torque (Tadhesion) will determine whether a colloid will be immobilized (TappliedTadhesion) or roll (Tapplied > Tadhesion) on a solid water interface. Previous literature has demonstrated in 1–2 collector (grain) systems that the influence of Tapplied on colloid retention can be significant under unfavorable attachment conditions and that only a fraction of the solid surface may contribute to retention. However, many questions remain on how to obtain, analyze, and upscale information on the forces and torques that act on colloids near solid surfaces in porous media. To address some of these gaps in knowledge, high resolution pore-scale water flow simulations were conducted for sphere packs (25 spheres) over a range of Darcy velocities, grain sizes and distributions, and porosities. The spatial variability of Tapplied was calculated from this information, and successfully described using a lognormal cumulative density function (CDF). Linear interpolation and scaling techniques were subsequently used to predict the lognormal CDF of Tapplied for various colloid sizes, grain sizes and distributions, and water velocities. The lognormal CDF of Tapplied was then evaluated at select values of Tadhesion (i.e, interaction energy) to quantify the fraction and locations on the solid surface that contributes to colloid retention (Sf), and the theoretical maximum solid phase concentration of retained colloids (Smax).

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700