OES and FTIR diagnostics of HMDSO/Ob>2b> gas mixtures for SiOb>xb> deposition assisted by RF plasma

详细信息	查看全文 | 推荐本文 |

• 作者：Goujon ; M. ; Belmonte ; T. ; Henrion ; G.
• 关键词：OES ; HMDSO/Ob>2b> ; RF plasma ; SiOxY ; FTIR
• 刊名：Surface and Coatings Technology
• 出版年：2004
• 期刊代码：106_02578972
• 类别：ms
• 出版时间：November - December, 2004
• 卷：188-189
• 期：Complete
• 页码：756-761
• 文件大小：425 K

摘要

A capacitively coupled radiofrequency PACVD process for SiOb>xb> deposition using oxygen-hexamethyldisiloxane (HMDSO) gas mixtures is characterised under a pressure of 1 Torr. Optical emission spectroscopy and FTIR absorption spectroscopy analyses are performed for different values of the dilution ratio Xb>hmb> of HMDSO in oxygen. The power delivered to the plasma is set high enough (5 W/cm²) to have a strong fragmentation of the monomer by electron impact. Two different regimes are then observed depending whether Xb>hmb> exceeds or not 20 vol.%. Below this critical value, the monomer fragments are strongly oxidised. Above, densities of CO and CHb>4b> molecules strongly decrease. Trends observed in the evolution of the species concentrations as a function of Xb>hmb> better agree the results by Aumaille et al. [K. Aumaille, C. Vall脙脙e, A. Granier, A. Goullet, F. Gaboriau, G. Turban, Thin Solid Films 359 (2000) 188] than those by Lamendola et al. [R. Lamendola, R. d脙脙脙Agostino, F. Fracassi, Plasmas Polym. 2 (1997) 147] despite the pressure set in this work is closer to that used by the latter.