Swift heavy ion irradiation induced texturing in NiO thin films
- 作者：P. Mallick ; D.C. Agarwal ; Ch ; ana Rath ; R. Biswal ; D. Behera ; D.K. Avasthi ; D. Kanjilal ; P.V. Satyam ; N.C. Mishra
- 关键词：Ion Irradiation ; Nanoparticles ; Electronic excitation ; Grain growth ; Texturing ; NiO
- 刊名：Nuclear Instruments and Methods in Physics Research Section B ; Beam Interactions with Materials and Atoms
- 出版年：2008
- 期刊代码：42_0168583x
- 类别：ph
- 出版时间：July 2008
- 卷：266
- 期：14
- 页码：3332-3335
- 文件大小：129 K
摘要
NiO thin films grown on Si(1 0 0) substrate by electron beam evaporation and sintered at 500 and 700 °C were irradiated with 120 MeV Au9+ ions. The FCC structure of the sintered films was retained up to the highest fluence (3 × 1013 ions cm−2) of irradiation. In the low fluence (
1 × 1013 ions cm−2) regime however, the evolution of the XRD pattern with fluence showed a wide variation, critically depending upon their initial microstructure. Though irradiation is known to induce disorder in the structure, we observe improvement in crystallization and texturing at intermediate fluences of irradiation.
1 × 1013 ions cm−2) regime however, the evolution of the XRD pattern with fluence showed a wide variation, critically depending upon their initial microstructure. Though irradiation is known to induce disorder in the structure, we observe improvement in crystallization and texturing at intermediate fluences of irradiation.