Microstructural and photocatalytic properties distribution of TiO₂ coatings reactively sputtered as a function of the substrate position relatively to the Ti target

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• 作者：E. Aubry ; P. Miska ; L. Gigleux ; A. Mé ; zin ; V. Demange ; A. Billard
• 关键词：Sputtering ; TiO₂ ; Photocatalysis ; Porous ; Stress ; High pressure ; Substrates position
• 刊名：Surface and Coatings Technology
• 出版年：2008
• 期刊代码：106_02578972
• 类别：ms
• 出版时间：15 July 2008
• 卷：202
• 期：20
• 页码：4980-4985
• 文件大小：1075 K

摘要

Amorphous and porous TiO₂ coatings were deposited by reactive magnetron sputtering at high pressure (3.4 Pa) on cold soda-lime glass placed at different positions relatively to the magnetron target, which corresponds to different impingement angles and target-to-substrate distances. The as-deposited coatings were heated at 450 °C under ambient air to crystallise into the photoactive anatase phase. The structural analyses combined with AFM experiments have shown a reduction of the crystallites and the lateral grain size with the removal of the substrate from the target axis inducing a specific area rise. Moreover, the stress state is all the less as compressive as the substrates are far away from the target. As a result, the photocatalytic properties are improved with the decrease of the incidence angle and with the target-to-substrate distance rise.