Effect of in situ Pt bottom electrode deposition and of Pt top electrode preparation on PZT thin films properties

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• 作者：Vilquin ; B. ; Le Rhun ; G. ; Bouregba ; R. ; Poullain ; G. ; Murray ; H.
• 关键词：81.15.Cd Deposition by sputtering ; 77.84.-s Dielectric ; piezoelectric ; ferroelectric ; and antiferroelectric materials ; 68.55.-a Thin film structure and morphology
• 刊名：Applied Surface Science
• 出版年：2002
• 期刊代码：6_01694332
• 类别：ms
• 出版时间：July 15, 2002
• 卷：195
• 期：1-4
• 页码：63-73
• 文件大小：511 K

摘要

Highly (100) oriented Pb(Zr, Ti)O₃ (PZT) thin films have been grown in situ at 500°C on Pt electrode by rf magnetron sputtering. The Pt bottom electrode has been sputtered in situ and influence of Pt deposition temperature on structural and electrical properties of PZT films have been investigated. The effect of preparation conditions of Pt top electrodes has also been examined. It was found that properties of PZT thin films were strongly dependent on the deposition temperature of the bottom electrode and on both the rf power and plasma composition during the sputtering of the top electrode.