A cinnamic acid-type photo-cleavable surfactant

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• 作者：Hideki Sakai^a ; ^{hisakai@rs.noda.tus.ac.jp} ; Shohei Aikawa^a ; Wataru Matsuda^a ; Takashi Ohmori^b ; Yuko Fukukita^b ; Yoji Tezuka^c ; Atsutoshi Matsumura^a ; Kanjiro Torigoe^a ; Koji Tsuchiya^d ; Koji Arimitsu^a ; Kazutami Sakamoto^a ; ^e ; Kenichi Sakai^a ; ^{k-sakai@rs.noda.tus.ac.jp} ; Masahiko Abe^a
• 关键词：Photo-cleavable surfactant ; Cinnamic acid ; Interfacial tension ; Solubilization
• 刊名：Journal of Colloid and Interface Science
• 出版年：2012
• 期刊代码：125_00219797
• 类别：ch
• 出版时间：15 June, 2012
• 卷：376
• 期：1
• 页码：160-164
• 文件大小：414 K

摘要

We have developed a novel cinnamic acid-type photo-cleavable surfactant. This surfactant experiences photo-cleavage through UV-induced cyclization in aqueous solutions. The photo-cleavage not only reduces its capabilities as a surfactant but also yields two functional materials including a coumarin derivative and an aminated polyoxyethylene compound. This means that the photo-cleavable surfactant synthesized in this study is a photo-responsive function-exchangeable material. In our current study, we have characterized the photo-cleavable behavior that occurs in aqueous solutions and a resulting change in interfacial properties. The photo-cleavage induces an increased interfacial tension of a squalane/water interface and a decreased solubilization capability of the surfactant micelles.