Erosion resistance of polycrystalline diamond films to atomic oxygen

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• 作者：Li ; Jingqi ; Zhang ; Qing ; Yoon ; S.F. ; Ahn ; J. ; Zhou ; Qiang ; Wang ; Sigen ; Yang ; Dajiang ; Wang ; Qiang
• 关键词：A. Diamond ; B. Oxidation ; C. Surface oxygen complex ; D. Reactivity
• 刊名：Carbon
• 出版年：2003
• 期刊代码：10_00086223
• 类别：ms
• 出版时间：2003
• 卷：41
• 期：9
• 页码：1847-1850
• 文件大小：122 K

摘要

Polycrystalline diamond films deposited using hot filament chemical vapor deposition (CVD) technique have been investigated in atomic oxygen simulated as low earth orbit environment to examine their erosion resistance properties. After exposure to the atomic oxygen beam with a flux of 2.6×10¹⁶ atoms/cm² s, the diamond films only show a small mass loss. The reaction efficiency is estimated to be between 6.35×10⁻²⁶ and 8.28×10⁻²⁶ cm³/atom. Oxidation mechanism is investigated through the reaction temperature influence on the reaction rate. We suggest that atomic oxygen reacts with diamond surface and forms ether (C–O–C) and carbonyl (>CO) configurations besides eroding the surface.