Internal stresses and stability of the tetragonal phase in zirconia thin layers deposited by OMCVD

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• 作者：B. Benali ; A.M. Huntz ; M. Andrieux ; M. Ignat ; S. Poissonnet
• 关键词：Zirconia thin films ; Tetragonal and monoclinic phases ; Phase transformation ; Tensile test ; Annealing
• 刊名：Applied Surface Science
• 出版年：2008
• 期刊代码：6_01694332
• 类别：ms
• 出版时间：15 July 2008
• 卷：254
• 期：18
• 页码：5807-5813
• 文件大小：1720 K

摘要

Zirconia thin films were deposited by OMCVD (organo-metallic chemical vapour deposition) at various temperatures and oxygen partial pressures on a AISI 301 stainless steel substrate with Zr(thd)₄ as precursor. The as deposited 250 nm thin zirconia films presented a structure consisting of two phases: the expected monoclinic one and also an unexpected tetragonal phase. According to the literature, the stabilization of the tetragonal phase (metastable in massive zirconia) can be related to the crystallite size and/or to the generated internal compressive stresses.