Patterning of polystyrene thin films by solvent-assisted imprint lithography and controlled dewetting

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• 作者：Kuan-Liang Lai^a ; Shiau-Fong Hsiao^a ; Min-Hsiung Hon^a ; ^b ; Ing-Chi Leu^c ; ^{icleu@mail.mse.ncku.edu.tw}
• 关键词：Polymer ; Dewetting ; Acetone ; Polystyrene sphere ; Solvent-assisted imprinting lithography
• 刊名：Microelectronic Engineering
• 出版年：2012
• 期刊代码：91_01679317
• 类别：cp
• 出版时间：June, 2012
• 卷：94
• 期：Complete
• 页码：33-37
• 文件大小：1057 K

摘要

This paper presents an innovative approach for the preparation of polystyrene (PS) micropatterns by using solvent-assisted imprinting lithography and demonstrates a controlled dewetting process for fabricating an ordered nanostructure from a polymer thin film. Uniform PS pattern can be fabricated at room temperature and low pressure (0.01 MPa) by a solvent-assisted imprinting method. The imprinted PS microlens marked change in morphology from dome to sphere because a spinodal dewetting process occurs after the acetone treatment. By adjusting the thickness of residual layer between imprinted domes, the orderly self-organized PS sphere arrays with bimodal and even multiple sizes can be fabricated. The combination of solvent-assisted imprinting and templated self-organization can be an effective method for the preparation of complex patterns with multiple sizes, which is not easy to be obtained with conventional photolithography process. Furthermore, the sub-micrometer PS pre-pattern can turn into photonic crystal arrays with 550 nm pitch by this dewetting process.