Application of PVD coatings for developing a DSA-type anode

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• 作者：Sang Sik Kim ; Sung Dae Kim
• 关键词：Unbalanced magnetron sputtering ; DSA electrode ; Iridium oxide ; Electrochemical properties
• 刊名：Thin Solid Films
• 出版年：2008
• 期刊代码：78_00406090
• 类别：ph
• 出版时间：1 April 2008
• 卷：516
• 期：11
• 页码：3673-3679
• 文件大小：1544 K

摘要

Preliminary studies were conducted to develop a dimensionally stable anode (DSA) electrode prepared by reactive sputtering method. The microstructure, surface morphology and electrochemical properties of iridium oxide (IrO₂) coatings synthesized by unbalanced magnetron sputtering (UBMS) and conventional DSA electrode were compared. In addition, the possibilities of IrO₂ films synthesized by UMB on a real DSA electrode were investigated by electro-chemical application test. The degree of non-stoichiometry and surface area were closely related to the electro-chemical activity of the IrO₂ electrode. The feasibility of making a DSA electrode prepared by PVD technique was demonstrated through the present work.