Fabrication of Insulating Micropatterns for Inner Electrode of Multilayer Ceramic Capacitor by Electrophoretic Deposition Based on SiO2 Nanopowder

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• 作者：Sheng-Chang Wang^a ; ^{scwang@mail.stut.edu.tw} ; Ya-Hwang Cheng^b ; Jow-Lay Huang^b
• 关键词：Micro electrophoretic deposition ; multilayer ceramic capacitor ; three-electrode system ; silica
• 刊名：Procedia Engineering
• 出版年：2012
• 期刊代码：P56_18777058
• 类别：et
• 出版时间：2012
• 卷：36
• 期：Complete
• 页码：528-533
• 文件大小：349 K

摘要

Micropatterns of silica were fabricated on interdigitated array (IDA) electrode used to be the insulting layer of inner electrode of multilayer ceramic capacitor (MLCC) by electrophoretic deposition. A three-electrode circuit system was applied to deposit the silica nanoparticle on the silver IDA electrode. The three-electrode system shows better deposition selectively of interval. Smaller IDA electrode spacing performed faster deposition rate and lower applied voltage. A crack-free film of silica was deposited at 10 V applied voltage for 20 s and sintered at 800oC. The resistance of micropattern film is 7 x 109 ohm. The adhesion between silica layer and electrode was improved after sintering.