Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process
- 作者：Sung-Hoon Hong ; Jong-Hwa Lee ; Heon Lee
- 关键词：Hot embossing ; Nickel st Nanoimprint lithography
- 刊名：Microelectronic Engineering
- 出版年：2007
- 期刊代码：91_01679317
- 类别：cp
- 出版时间：May-August 2007
- 卷：84
- 期：5-8
- 页码：977-979
- 文件大小：427 K
摘要
Fabrication of imprint stamp is a key issue of nanoimprint lithography. In this study, we attempt to fabricate the nickel imprint stamp using hot embossing lithography and electroforming processes. As small as 50 nm sized patterns of original silicon master were faithfully transferred to polyvinyl chloride (PVC) film. By electroforming on hot embossed PVC film, nickel stamp, which has the same patterns of original silicon master stamp, was successfully fabricated.