Relationship between chemical compositions of magnetron sputtered B-C-N films and various experimental parameters

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• 作者：Changyu Guan^a ; ^b ; Jijun Zhao^a ; ^b ; ^{zhaojj@dlut.edu.cn} ; Fuchao Jia^a ; Chunqiang Zhuang^c ; Yizhen Bai^a ; Xin Jiang^c
• 关键词：B&ndash ; C&ndash ; N coating ; Composition ; Magnetron sputtering
• 刊名：Vacuum
• 出版年：2012
• 期刊代码：83_0042207x
• 类别：ph
• 出版时间：27 April, 2012
• 卷：86
• 期：10
• 页码：1499-1504
• 文件大小：762 K

摘要

By adjusting a series of experimental parameters, amorphous B-C-N films with various compositions were synthesized on silicon (100) substrate via radio frequency magnetron sputtering. The bonding characteristics and chemical compositions of B-C-N films were characterized by FTIR and XPS. On the B-C-N ternary phase diagram, the chemical compositions of most synthesized films distribute near the C-BN isoelectronic line. Among them, the low-carbon compositions can be obtained by decreasing the N₂/Ar flow ratio, increasing the power of boron and graphite targets simultaneously, or increasing the substrate temperature; those carbon-rich ones can be prepared by introducing the CH₄ gas into the mixture of N₂/Ar reactive gas. Therefore, it is possible to control the compositions of B-C-N films by adjusting a set of experimental parameters.