Comparison of experimental and theoretical results of nitrogen implantation in AISI 304 stainless steel

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• 作者：Gazestani ; S.H. Haji Hosseini ; Shahraki ; M. Gholipour ; Hantehzadeh ; M.R. ; Ghoranneviss ; M. ; et. al.
• 关键词：68 ; 68.47.De ; Nitrogen implantation ; SIMS ; Simulation ; Stainless steel ; Depth profile
• 刊名：Applied Surface Science
• 出版年：2004
• 期刊代码：6_01694332
• 类别：ms
• 出版时间：October 15, 2004
• 卷：237
• 期：1-4
• 页码：332-335
• 文件大小：200 K

摘要

Depth and distribution of implanted ions play an important role in electrical and mechanical properties of implanted surfaces. In this study nitrogen implantation at 30keV with different doses in the range of 1 × 10¹⁷–1 × 10¹⁸ions/cm² on AISI 304 stainless steel samples has been performed. The experimental and theoretical depth profiles of nitrogen-implanted samples are investigated. Experimental depth profile using secondary ion mass spectrometry (SIMS) is compared with theoretical analysis (TRIM simulation). By considering the presence of N₂⁺ in the implanting ion beam and sputtering effects, the TRIM and SIMS results were modified to good agreement. The proper ratio of N₂⁺/N⁺ is evaluated by a curve fitting procedure.