Laser-induced damage mechanism of the sol–gel single-layer SiO2 acid and base thin films
- 作者：Y.J. Guo ; X.T. Zu ; X.D. Jiang ; X.D. Yuan ; W.G. Zheng ; S.Z. Xu ; B.Y. Wang
- 关键词：LIDT ; Thermal absorption ; Porous ratio ; Damage morphology
- 刊名：Nuclear Instruments and Methods in Physics Research Section B ; Beam Interactions with Materials and Atoms
- 出版年：2008
- 期刊代码：42_0168583x
- 类别：ph
- 出版时间：June 2008
- 卷：266
- 期：12-13
- 页码：3190-3194
- 文件大小：1737 K
摘要
Sol–gel single-layer silica acid and base thin films on K9 glass substrates were prepared with the dip-coating method from acid and base catalyzed silica sols, respectively. Laser-induced damage threshold (LIDT) of each film was measured. Properties of the films were analyzed using Stanford photo-thermal solutions (SPTS), ellipsometry, atomic force microscopy (AFM) and optical microscopy to study the damage mechanism of the films under laser irradiation. The experimental results showed that compared with the silica base film, the silica acid film had larger absorption and smaller porous ratio, and it had smaller LIDT. The different damage morphologies of films were influenced by their different absorption and microstructure characteristics. The silica base film is more suitable for applications involving high power lasers.