Influence of raw gases on B–C–N films prepared by electron beam excited plasma CVD
详细信息查看全文 | 推荐本文 |
摘要
B–C–N films were deposited with electron beam excited plasma–chemical vapor deposition focusing on the structural stability where their compositions lie in the vicinity of BN. Film composition was controlled by varying process gas flow rates and was x

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700