A simple retardation system for low-energy implantation of mass-separated radioactive ions

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• 作者：Muramatsu ; Hisakazu ; Ishii ; Hiroko ; Tanaka ; Eishi ; Osa ; Akihiko ; Koizumi ; Mitsuo ; Sekine ; Toshiaki ; et. al.
• 关键词：85.40.Ry ; 34.50.Bw ; 41.85.-p ; Retardation ; ¹³³Xe implantation ; Isotope separator ; Projected mean range
• 刊名：Nuclear Instruments and Methods in Physics Research Section B ; Beam Interactions with Materials and Atoms
• 出版年：1998
• 期刊代码：42_0168583x
• 类别：ph
• 出版时间：January, 1998
• 卷：134
• 期：1
• 页码：126-135
• 文件大小：712 K

摘要

A simple retardation system has been constructed in order to realize low-energy ion-implantations using an electro-magnetic isotope separator (EMIS). Mass-separated ions are decelerated through a smoothly increasing potential which is produced in a box which is coated inside with a highly resistive film. To test the performance of the system, ¹³³Xe ions retarded from 20 keV by a maximum of 15 keV were implanted into a nickel foil covered by a thin copper layer, and their mean range in copper was determined with a radiochemical technique. The observed ranges are in good agreement with theoretical prediction, which manifests that the system works well as expected.