The present paper describes a novel approach to quantify nitric acid (HNO3), hydrofluoric acid (HF), and hexafluosilicic acid (H2SiF6) using a high-resolution continuum source graphite furnace absorption spectrometer. The concentrations of Si (via Si atom absorption at the wavelength 251.611 nm, m0,Si = 130 pg), of nitrate (via molecular absorption of NO at the wavelength 214.803 nm, ), and of total fluoride (via molecular absorption of AlF at the wavelength 227.46 nm, ) were measured against aqueous standard solutions. The concentrations of H2SiF6 and HNO3 are directly obtained from the measurements. The HF concentration is calculated from the difference between the total fluoride content, and the amount of fluoride bound as H2SiF6. H2SiF6 and HNO3 can be determined with a relative uncertainty of less than 5%and recoveries of 97-103%and 96-105%, respectively. With regards to HF, acceptable results in terms of recovery and uncertainty are obtained for HF concentrations that are typical for the photovoltaic industry. The presented procedure has the unique advantage that the concentration of both, acids and metal impurities in etch solutions, can be routinely determined by a single analytical instrument.