Non-destructive X-ray study of the interphases in Mo/Si and Mo/B₄C/Si/B₄C multilayers

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• 作者：H. Maury ; P. Jonnard ; J.-M. André ; J. Gautier ; M. Roulliay ; F. Bridou ; F. Delmotte ; M.-F. Ravet ; A. Jé ; rome and P. Holliger
• 关键词：Multilayer interferential mirrors ; Diffusion ; Molybdenum ; Silicon ; Silicide ; Secondary ion mass spectrometry ; X-ray reflectivity ; X-ray emission spectroscopy
• 刊名：Thin Solid Films
• 出版年：2006
• 期刊代码：78_00406090
• 类别：ph
• 出版时间：30 August 2006
• 卷：514
• 期：1-2
• 页码：278-286
• 文件大小：478 K

摘要

We have tested and validated a non-destructive analysis method of multilayer structure, which combine X-ray emission spectroscopy and X-ray reflectometry at 0.154 and 1.33 nm. In this purpose, a series of Mo/Si and Mo/B₄C/Si/B₄C multilayers, deposited by magnetron sputtering, have been designed. The thickness of the Mo layer is 2 nm and that of the Si layers varies between 1 and 4 nm. The B₄C layer thickness introduced at the Mo/Si and Si/Mo interfaces is 0.3 or 1 nm. It is shown that the reflectivity of the multilayers lowers with the decreasing silicon thickness. This is correlated to the diffuse character on the nanometer scale of the Mo/Si and Si/Mo interfaces as shown by secondary ion mass spectrometry, and the formation of silicides (MoSi₂ and Mo₅Si₃) at these interfaces as evidenced by X-ray emission spectroscopy. As expected, the introduction of B₄C diffusion barriers considerably improves the reflectivity coefficient in the soft X-ray range, due to thinner and more abrupt interfaces.