Study on the Resistance Characteristic of Pt Thin Film
- 作者：Yujia Zhai ; Changlong Cai ; changlongcai@126.com ; Jing Huang ; Huan Liu ; Shun Zhou ; Weiguo Liu
- 关键词：68.60.Dv thermal stability ; thermal effects
- 刊名：Physics Procedia
- 出版年：2012
- 期刊代码：P128_18753892
- 类别：ph
- 出版时间：2012
- 卷：32
- 期：Complete
- 页码：772-778
- 文件大小：1042 K
摘要
In this paper, Pt thin film was prepared as thermal resistor in bolometer. The measurements showed that the vacuum annealing proved to be an effect method to gain good resistance-temperature properties. The temperature coefficient of resistance (TCR) of resistance 1.28K惟 can be improved by vacuum annealing to achieve 1.737鈥?K.What is obtained by experiment is that the values of TCR will be affected not only by annealing parameters, but also by the film thickness used, the films with 100 nm thickness can achieve 2.3鈥?K, while that with 17 nm can only get 1.1鈥?K.