SOI nanophotonic waveguide structures fabricated with deep UV lithography

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• 作者：Bogaerts ; W. ; Dumon ; P. ; Taillaert ; D. ; Wiaux ; V. ; Beckx ; S. ; Luyssaert ; B. ; Van Campenhout ; J. ; et. al.
• 关键词：42.82.E ; 42.79 ; 85.60 ; 42.82.C ; 42.81.Q ; Nanophotonics ; Photonic crystal ; Photonic wire
• 刊名：Photonics and Nanostructures - Fundamentals and Applications
• 出版年：2004
• 期刊代码：120_15694410
• 类别：ms
• 出版时间：October, 2004
• 卷：2
• 期：2
• 页码：81-86
• 文件大小：398 K

摘要

To reduce the dimensions of photonic integrated circuits, high-contrast wavelength-scale structures are needed. We developed a fabrication process for Silicon-on-insulator nanophotonics, based on standard CMOS processing techniques with deep UV lithography. Measurements using either end-fire incoupling or grating-based fibre couplers show photonic crystal waveguides with moderate propagation losses (7.5 dB/mm) and photonic wires with very low propagation losses (0.24 dB/mm).