A simple method for chemical bath deposition of electrochromic tungsten oxide films

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• 作者：Metodija Z. Najdoski ; Toni Todorovski
• 关键词：Thin films ; Semiconductors ; Crystal structure ; Crystal growth
• 刊名：Materials Chemistry and Physics
• 出版年：2007
• 期刊代码：58_02540584
• 类别：ms
• 出版时间：15 August 2007
• 卷：104
• 期：2-3
• 页码：483-487
• 文件大小：599 K

摘要

A simple, economical, chemical bath method for depositing tungsten oxide films has been developed. The films have been prepared from aqueous solution containing Na₂WO₄·2H₂O and diethyl sulfate in slightly acidic media at 90–95 °C on fluoride doped tin oxide substrates (FTO). The X-ray analysis clearly showed that the films do not correspond to any known tungsten oxide with its experimental d-values and in the text the composition is denoted as WO_x. The thin films durability was tested in aqueous solution of LiClO₄ (0.1 mol dm⁻³) for about 7000 cycles followed by cyclic voltammetry which confirmed that the coated material is highly stable. The optical transmittance spectra of colored and bleached states showed significant change in the transmittance, which make these films favorable for electrochromic devices.